• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
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    • 专利摘要:
    A device (100) for treating light radiation (108) comprising at least two reflective optical elements (102, 104) defining a multipass cavity (106) so that at least one of said optical elements (102, 104) ) reflects said light radiation (108) at least twice in at least two different reflection locations, characterized in that it comprises at least one element, said corrector, having at least one location, said corrector, making a reflection or transmission said optical radiation and whose surface is irregular so that the spatial phase profile of said correcting location (116) has a different phase shift for several different points of reflection or transmission of said correcting location (116). The invention also relates to a method and a system for designing such a device (100).
    公开号:FR3016973A1
    申请号:FR1450715
    申请日:2014-01-30
    公开日:2015-07-31
    发明作者:Jean-Francois Morizur；Guillaume Labroille；Nicolas Treps
    申请人:Cailabs SAS；
    IPC主号:
    专利说明:

    [0001] The present invention relates to a device for the treatment of a light / optical radiation, in particular by a succession of propagations and a device for the treatment of a light / optical radiation. changes in the spatial phase of the light radiation. It also relates to a method and a system for designing such a device.
    [0002] The field of the invention is the field of the treatment of an optical radiation and in particular the field of the treatment of an optical radiation requiring a succession of propagations of the light radiation.
    [0003] STATE OF THE ART Document W02012 / 085046 A1 describes a system for correcting the effect of a scattering medium on optical radiation having propagated in this scattering medium, or for arbitrarily transforming the spatial properties of an optical radiation. This is a light treatment system. The system described in this document comprises a plurality of optical means (phase plates or spatial phase modulators), separated from each other, whose phase profile can be adjusted individually during an optimization step, and which allow each to modify the spatial phase of the light radiation that passes through them or is reflected on them. This is the sequence of these spatial phase changes of the light radiation separated by propagations which makes it possible to generally treat the light radiation. More generally, the optical systems for processing light radiation comprise a plurality of optical means separated from each other and each performing a given treatment on the optical radiation. These optical systems which comprise several optical means for modifying the phase profile of the radiation and in which the optical radiation carries out a succession of propagations have a major disadvantage. In these systems, the positioning of the optical means relative to each other and with respect to the light radiation, must be very precise, typically of the order of one micron, which can be difficult to achieve, consumer in time of assembly, and increases the constraints on the rigidity of the assembly. The incorrect positioning of an optical element causes a degradation of the processing performed on the optical radiation. The optical radiation at the output of the processing device is therefore degraded. This degradation may take the form of, for example, loss of intensity or unwanted spatial deformation of the output radiation. The invention aims to overcome the aforementioned drawbacks. Another object of the invention is to provide an optical radiation treatment device easier to construct. Yet another object of the present invention is to provide a device for processing optical radiation faster to build. Finally, another object of the present invention is to propose a device for treating optical radiation that is more resistant to shocks and vibrations. DISCLOSURE OF THE INVENTION The invention makes it possible to achieve at least one of the aforementioned objects by a device for treating a light radiation comprising at least two reflective optical elements defining a multipass cavity so that at least one of said optical elements reflects said light radiation at least twice, in particular at least two different reflection locations, characterized in that it comprises at least one element, said corrector, having at least one location, said corrector, making a reflection or a transmission of said optical radiation and whose surface is irregular so that the spatial phase profile of said corrector location has a different phase shift for several different reflection / transmission points of said corrector location. In other words, a correction location modifies the phases of at least two spatial components of a light radiation differently. Thus, the device according to the invention processes a light or optical radiation by a fixed multipasspass cavity and by a small number of optical elements, wherein the light radiation is reflected a plurality of times. The spatial phase of the light radiation is modified during at least one reflection or transmission on at least one corrective element.
    [0004] Consequently, the device according to the invention realizes, with the same fixed corrective element, one or more spatial phase modifications of the light radiation. More generally, the device according to the invention makes it possible to carry out a plurality of modifications of the spatial phase of the light radiation with one and the same fixed optical element, which may have different phase profiles for different locations of reflection or transmission, whereas state-of-the-art systems plan to use as many optical elements as modifications of the spatial phase of the light radiation.
    [0005] The device according to the invention is easier to set up, to use and faster to configure, because the number of optical elements to be positioned between them and with respect to the optical radiation is lower. In addition, the small number of optical elements makes the device according to the invention less expensive to manufacture and improves the rigidity and strength of the final system. Of course, in the case of a multipass cavity, the optical radiation is reflected on each reflecting element in turn. In other words, two reflections of the optical radiation on one of the reflective optical elements defining the multipass cavity are separated by a reflection on the other reflective optical elements defining the multipass cavity. In the present invention, "the spatial phase of the radiation" is defined by the phases of the set of spatial components of the radiation. In addition, the "spatial phase profile of a corrective location" (reflection or transmission) is defined by the set of spatial phase shifts (changes in the spatial phase) provided by all the points of reflection or transmission. said corrector location on the different spatial components of the light radiation during the same reflection or transmission of radiation on said corrector location. The phase profile can be very simple in the case of reflection on a plane mirror. In addition, according to the invention, a corrective location may realize either a reflection of the radiation or a transmission of the radiation.
    [0006] According to the invention, the irregularities of a corrective location can be obtained: by modifying the depths of the reflection or transmission surface by etching said surface or deposition of a resin on said surface, in which case the depth of reflection or transmission is modified, and / or - by depositing on or realizing the correcting location with a material modulating the phase of the spatial components of the radiation, in which case the depth of reflection or transmission is not modified, by example with liquid crystals. According to a preferred embodiment, but in no way limiting, the irregularities of a corrective location may have spatial structures at least 5 times smaller than the total size of the corrector location. Advantageously, at least one corrective optical element may be formed by one of the reflective optical elements defining the multipass cavity. In this case, the number of optical elements of the device according to the invention is reduced because the same optical element is both corrector and defines the multipass cavity. According to a particular embodiment, the device according to the invention may comprise a single corrective element corresponding to one of the reflective optical elements defining the multipass cavity. Thus, the device according to the invention is simpler to configure and less expensive because it requires a single optical element modifying the spatial phase of the radiation which also defines the multipass cavity.
    [0007] According to another particular embodiment, the device according to the invention may comprise two corrective elements respectively corresponding to the reflective optical elements defining the multipass cavity. In this case, each reflective optical element defining the multipass cavity comprises at least one corrective reflection location modifying the spatial phase of the radiation. In this version, the device according to the invention makes it possible to modify the spatial phase of the light radiation by the two reflecting elements defining the multipass cavity. Thus, it is possible to perform a more complete treatment of the light radiation with a lower number of reflections in the multipass cavity. Therefore, in this version, the device according to the invention performs a treatment of the light radiation by minimizing the number of optical elements required.
    [0008] According to the invention, at least one corrective element may be disposed in the multipass cavity and be distinct from the reflective optical elements defining said multipass cavity. In this case, at least one of the reflective optical elements 30 defining the multipass cavity can also be corrective. Alternatively, the reflective optical elements defining the multipass cavity may not be correctors. In a preferred version of the device according to the invention, at least two, in particular all, reflection locations of at least one corrective element are corrective. Thus, each correction location has an irregular reflection or transmission surface so that the spatial phase profile of each correction location has a different phase shift for several reflection points or transmission of said correcting location. In this version, the device according to the invention makes it possible to modify the spatial phase of the light radiation during several, in particular all the reflections or transmissions, on the corrective element. Thus, it is possible to perform a more complete and more complex treatment of the light radiation in the multipass cavity. Advantageously, at least two correcting locations of the same corrector element have different phase profiles. Thus, the device makes it possible to modify the spatial phase of the radiation differently during reflections or transmissions on these two correcting locations of the same corrective optical element. Alternatively or additionally, at least two correcting locations of the same corrector element have identical phase profiles. Thus, the device makes it possible to modify in an identical manner the spatial phase of the radiation during reflections or transmission on these two corrective locations of the same corrective optical element.
    [0009] In addition, at least two correcting locations of two different optical correction elements may have identical or different spatial phase profiles. According to an exemplary embodiment, at least one corrective optical element 30 may be a phase plate. Advantageously, at least one corrective optical element may be a phase plate having at least two different spatial phase profiles for at least two correcting locations. In this case, the phase plate covers at least two different correcting locations. Each portion of the phase plate corresponding to a correcting location has a desired spatial phase profile for that correcting location, which may be different from the desired spatial phase profile for another correcting location covered by the phase plate. Thus, the single phase plate covering several corrective locations comprises at least two parts having different spatial phase profiles. In this embodiment the construction of the device according to the invention is facilitated because a single phase blade is manipulated and positioned in the multipass cavity. According to an exemplary embodiment, the phase plate may be an etched mirror, but may also be a resin deposited on a substrate. Advantageously, at least one corrective optical element may be a spatial phase modulator having at least two different spatial phase profiles for at least two correcting locations. In this case, the spatial phase modulator covers at least two different correcting locations. Each portion of the spatial phase modulator corresponding to a correction location has a desired spatial phase profile for that correction location, which may be different from the desired spatial phase profile for another correcting location covered by the phase plate. Thus, the single spatial phase modulator covering several correcting locations comprises at least two parts having different spatial phase profiles. In this embodiment, the cost of the device according to the invention is reduced because a single and only spatial phase modulator is necessary for the device. According to an exemplary embodiment, the spatial phase modulator may be a mirror deformed by actuators, but may also be a liquid crystal matrix whose birefringence properties are controlled by an array of electrodes. In addition, at least one reflective element defining the multipass cavity may comprise a through opening for injecting the optical radiation to be treated into the multipass cavity and / or to release the optical radiation from said multipass cavity after treatment. In a preferred and non-limiting embodiment of the device according to the invention, one of the reflective optical elements may have a flat reflective surface and the other of the reflective optical elements may have a curved reflective surface. In particular, the planar surface may be a phase plate having one or more corrective reflection sites, the curved surface not requiring any modification of the particular spatial phase of the light radiation other than the mentioned curvature. In a preferred, but in no way limiting, version of the device according to the invention, the reflective optical elements defining the multipass cavity can be positioned in two mutually perpendicular directions. In this case, the device according to the invention may further comprise a mirror, said intermediate, arranged facing said reflective optical elements at an angle of 45 ° with respect to the direction of each of said reflective optical elements, and reflecting 99% of light radiation. The intermediate mirror may be a corrective element or not. In this non-limiting version, the device according to the invention is easier to configure because it is easy to observe each of the reflective optical elements individually by observing, for example the 1% of the light radiation passing through the intermediate mirror. In this version of the device according to the invention, the multipass cavity is called "bent". According to another aspect of the invention there is provided a method for processing optical radiation using a device according to the invention. According to yet another aspect of the invention there is provided a system for processing optical radiation, said system comprising: - a device according to the invention; means for injecting said radiation into said correction device; and means for collecting the radiation at the output of said correction device. According to yet another aspect of the invention there is provided a method for designing a device according to the invention, said method comprising the following steps: propagating the optical radiation to be treated and a so-called reference radiation in a defined multipass cavity between two reflective optical elements so that at least one of said optical elements reflects said optical radiation at least twice, in particular at at least two different reflection locations; optimizing the interference between said radiations, said optimization comprising at least one iteration of the following steps carried out for at least one correction location, on at least one corrective element: determining a parameter relating to an interference between said radiations, for example at level of said at least one correcting location, and - modifying the spatial phase profile of said at least one corrective location; and - configuring, at said at least one corrective location, the spatial phase profile, determined in said optimization step, and providing the optimized interference.
    [0010] Each of the radiation to be processed and referenced may be: radiation effectively propagated in said multipass cavity, the reference radiation propagating in a direction of propagation opposite to the direction of propagation of the optical radiation to be treated; or - virtual radiation represented by a set of digital data. In this second case, the propagation of the radiation reflects the properties measured in the multipass cavity. In the case where the radiation to be treated and / or the reference radiation is virtual, the method may comprise a step for collecting data on the geometry of the multipass cavity by measuring the positions and the amplitude distribution of the reflections or transmissions of the reference radiation and / or treatment, on the various optical elements in the absence of phase profile. Such a measurement can be made by measuring means, such as a CCD camera, arranged opposite or behind the reflection or transmission location. In the case where the multipass cavity is bent, the intermediate mirror may be partly reflective and the measuring means, for example the CCD camera, may be arranged behind the intermediate mirror opposite the corrector location, and more generally facing of the reflecting or transmitting element on which the corrective reflection location is located. The radiation to be treated and / or the reference radiation may be propagated in the multipassage cavity by simulation on computer means, the simulation taking into account the characteristics of the cavity, namely optical and physical characteristics of the optical elements defining the cavity, the length of the cavity, the relative angles of the different optical elements, etc .; characteristics calculated using, inter alia, the information captured during the data collection step relating to the geometry of the multipass cavity. The propagation of the reference virtual radiation and to be processed through the cavity can be carried out to provide the characteristics of the reference radiation and to be processed at each of the corrective locations in the cavity, namely the intensity and the phase shift. each spatial component of the reference radiation and the radiation to be treated at each of the correcting locations, so as to determine the correlation parameter of these two radiations as described above.
    [0011] Moreover, in the case where the treatment to be carried out is the correction of the effect of a scattering medium on an optical radiation having traversed this medium, the radiation to be treated is obtained at the output of the scattering medium and the reference radiation may advantageously be identical to said radiation to be treated before said radiation to be treated has traveled said diffusing medium. In other words, the reference radiation may be identical to the radiation to be treated before it travels through the scattering medium.
    [0012] The correlation parameter can be determined at each correcting, reflecting, or transmitting location in the multipass cavity, or only at only a portion of the correcting locations in the cavity. For example, the correlation parameter can be measured only at the corrective locations provided for applying a treatment to the optical radiation to be processed. This correlation parameter may be the difference in spatial phase between the radiation to be treated and the reference radiation. Alternatively or in addition, the correlation parameter can be measured at the output of the multipass cavity.
    [0013] WO2012 / 085046 A1 includes more precision on interference measurements and optimization. The method of configuring a corrective location (reflection or transmission) may include a step of measuring the characteristics of the radiation to be processed and reference at this corrector location. Such a measurement can be carried out by a measuring means, such as a CCD camera, arranged opposite or behind the correcting location. In the case where the multipass cavity is bent, the intermediate mirror may be partly reflective and the measuring means, for example the CCD camera, may be arranged behind the intermediate mirror opposite the corrector location, and more generally facing the reflective / transmitting element on which the correcting location is located. For a given corrective location, the step of configuring the optimized light radiation processing device, determined during the optimization step, and providing the desired treatment, can comprise the following steps: - manufacture of a blade of phase comprising the optimized phase profile (s), - positioning of the phase plate at (x) said corrector location (s). The phase plate may be either an individual phase plate for a correction location, or a common phase plate at several correcting locations and having different optimized phase profiles on different regions of its surface each corresponding to a correcting location. According to yet another aspect of the invention there is provided a system for designing a device according to the invention, said system comprising: at least one means for propagating the radiation to be treated and a so-called reference radiation in a multipass cavity defined between two reflective optical elements so that at least one of said optical elements reflects said optical radiation at least twice, in particular at at least two different reflection locations; means for optimizing the interference between said radiations, said optimization being able to be carried out either numerically or optically, comprising at least one iteration of the following steps carried out for at least one corrective location on at least one corrective element: determining, a parameter relating to an interference between said radiations, for example at said at least one corrective location, and modifying the spatial phase profile of said at least one corrective location; and at least one means for configuring, at said at least one corrective location, the phase profile, determined during said optimization step, and providing the optimized interference.
    [0014] Other advantages and characteristics will appear on examining the detailed description of examples which are in no way limitative, and the appended drawings in which: FIG. 1 is a schematic representation of a nonlimiting exemplary embodiment of a device according to FIG. invention; and FIG. 2 is a schematic representation of another nonlimiting exemplary embodiment of a device according to the invention; - FIGURE 3 is a representation in the form of a diagram of a non-limiting example of a method according to the invention for the design of a device according to the invention; and FIG. 4 is a schematic representation of a nonlimiting example of a system according to the invention for the design of a device according to the invention.
    [0015] It is understood that the embodiments which will be described in the following are in no way limiting. It will be possible, in particular, to imagine variants of the invention comprising only a selection of characteristics described subsequently isolated from the other characteristics described, if this selection of characteristics is sufficient to confer a technical advantage or to differentiate the invention with respect to the state of the art. This selection comprises at least one preferably functional feature without structural details, or with only a portion of the structural details if that portion alone is sufficient to confer a technical advantage or to differentiate the invention from the state of the invention. prior art. In particular, all the variants and all the embodiments described are combinable with each other if nothing stands in the way of this combination at the technical level. In the figures, the elements common to several figures retain the same reference. FIGURE 1 is a schematic representation of a first nonlimiting example of a light radiation treatment device. The device 100 shown in FIGURE 1 comprises two reflecting optical elements 102 and 104 forming between them a multipass cavity 106 in which a light radiation to be treated 108 undergoes a plurality of reflections and propagations. The reflective element 104 has a through opening 110 allowing the optical radiation to enter the multipass cavity 106 to be processed and exit the cavity 108 after being processed. The reflective element 102 has a flat reflective surface 112 and the reflective element 104 has a concave or curved reflective surface 114. The multipass cavity defined by the mirrors 102 and 104 is arranged so that the light radiation 108 is reflected a plurality of times by each of the mirrors, in different locations, and this in turn. Thus, in the example shown, the plane mirror 102 reflects the optical radiation 108 eight times at eight different reflection locations on the planar surface 112, and the curved mirror 104 reflects the optical radiation 108 seven times at seven different reflection locations on the flat surface 114. The reflecting element 104 is formed by a curved or concave mirror and does not apply any modification to the spatial phase profile of the optical radiation 108 outside its curvature. Reflective element 102 is said corrector. This reflective element 102 is formed by a plane mirror whose reflective surface - 1 - is deformed at the wavelength scale, applying a change in the spatial phase of the optical radiation. To do this, the deformed plane mirror has, at each reflection location 116, an irregular surface so that each reflection location 116 is corrective and has a spatial phase profile that changes the spatial phase of the radiation 108. Thus, each region / zone / reflection location 1161-1168 has different depths for at least two spatial components of the radiation 108 and makes a change in the spatial phase of the optical radiation 108, that is to say different phase shifts of at least two Spatial components of the radiation 108. In the example shown in FIGURE 1, the reflective element 104 is non-corrective. Alternatively, the reflective element 104 may also be corrective, at least for a part of the reflection locations on this reflecting element 104. In the example shown in FIG. 1, the reflecting element 102 is corrector for each reflection location on this reflection element. Reflective element 102. Alternatively, reflective element 102 can be corrector for only part of the reflection locations on this reflecting element 102. In the example shown in FIGURE 1 all corrective reflection sites 116 are shown differently. that is, with different spatial phase profiles. Alternatively, each corrective reflection location 116 may have the same irregularity, that is to say a phase profile identical to that of another corrective reflection location 116. FIG. 2 is a schematic representation of a second example non-limiting of a device for processing a light radiation.
    [0016] The device 200 shown in FIG. 2 comprises all the components of the device 100 of FIG. 1. In the device 200, the reflecting elements 102 and 104 are arranged in two directions, respectively 202 and 204, perpendicular to one another, whereas on the FIGURE 1 they are arranged in the same direction or in two directions parallel to one another. The multipass cavity 106 obtained with the device of FIG. 2 is said to be bent. The device 200 further comprises an intermediate mirror 206 arranged facing the elements reflecting at an angle of 45 ° with respect to each of the directions 202 and 204. The intermediate mirror 206 serves to direct the optical radiation 108 coming from a reflective elements 102 or 104 to the other of the reflective elements 104 or 102. The intermediate mirror 206 is a 99% reflecting mirror. Consequently, this mirror 206 passes 1% of the radiation 108 each time it is reflected on this intermediate mirror 206. FIGURE 3 is a representation in the form of a diagram of a non-limiting example of a method according to the invention for the design of a device according to the invention. The method 300 comprises an initial step 302 for producing a multipass cavity, for example the cavity 106 by combining two mirrors 104 and 106. The method then comprises a step 304 for characterizing the geometry of the measuring cavity, c that is, determining the geometric characteristics of the cavity, reflection locations, etc. Such a step may be carried out by propagation in the cavity of a radiation, for example the radiation to be treated. In a step 306, the method determines the optimized phase profiles for at least two corrective reflection locations on at least one of the reflective elements defining the multipass cavity. This step 306 comprises at least one iteration of the following steps carried out for each relevant corrective reflection location of each corrective reflecting element: a step 308 during which the radiation to be treated and the reference radiation are propagated numerically (in opposite directions ) up to the level of the corrector reflection location, taking into account the already calculated phase profiles for the other corrective reflection locations; a step 310 during which the value of the relative phase between the reference radiation and the radiation to be treated is determined at the location of reflection; and a step 312 digitally modifying the phase profile at the corrective reflection location to compensate for the relative phase between the reference radiation and the radiation to be processed at the reflection location.
    [0017] Steps 308-312 are iterated as many times as necessary to obtain a recovery value (spatial scalar product) optimized radiation, for example previously determined. The iteration of these steps makes it possible to determine an optimized phase profile for each relevant corrective reflection location, making it possible to obtain an optimized correlation parameter between the radiation to be treated and a reference radiation. During a step 314, carried out after step 306, one or more phase plates, comprising for each corrective reflection location the optimized phase profile, are printed on the reflective element concerned, for example by etching the reflective face 112 of the mirror 102. FIGURE 4 is a schematic representation of a non-limiting example of a system according to the invention for the design of a device 25 according to the invention. The system 400 comprises a CCD camera 402 for measuring the radiation to be treated at a plurality of reflection locations on a reflecting element defining the multipass cavity, these measurements making it possible both to characterize the radiation to be treated 30 as well as the geometric properties of the multipass cavity. A module 404 makes it possible, by simulation, to apply different phase profiles for each of the relevant corrective reflection locations in order to determine the optimized phase profile for each corrective reflection location. Finally, a module 406 makes it possible to simulate the propagation of the radiation to be treated and of the reference radiation within the multipass cavity in the presence of the phase profiles provided by the module 404, in order to determine the value of a parameter of correlation between the radiation to be treated and the reference radiation at different correcting locations as a function of: measurements made by the CCD camera 402, in particular the characterization of the radiation to be treated and the geometry of the multipass cavity, and spatial phase profiles provided by the module 404; and - virtual reference radiation, represented by a set of digital data. Depending on the correlation parameter determined by the module 406, the phase profile at the location considered in the module 404 is modified.
    [0018] When the module 406 determines an optimized value of the correlation parameter, the phase profiles determined by the module 404 providing this optimized value are stored in storage means 408. These optimized phase profiles are then used to fabricate / configure a module. or phase blades, provided (s) to be arranged (s) instead of the reflective element concerned. Alternatively, it is possible to print the phase plate (s) directly on the reflective element concerned as described with reference to FIG.
    [0019] In FIGURE 4, the system 400 is shown in combination with the device 200 of FIGURE 2. In this configuration, the CCD camera 402 is positioned behind the intermediate mirror 206 and is focused on the reflective surface of the reflective element concerned. that is, the reflective surface 112 of the plane mirror 102.
    [0020] However, it is also possible to use the system 400 of FIGURE 4 to design a device according to the configuration shown in FIGURE 1. In this case, the CCD camera 402 is positioned behind the reflective element concerned, ie behind the mirror 102. Of course, the invention is not limited to the examples which have just been described. For example, in the examples given, the corrective element is an optical element defining the multipass cavity. Alternatively or additionally, it is possible to have at least one corrective optical element which is distinct from the reflective optical elements defining the multipass cavity and arranged between these reflecting elements, such a corrective optical element possibly being an optical element that reflects or transmits the radiation. For example, in the given examples, the correcting locations are all reflective locations for the light radiation. Alternatively or in addition, it is possible to have at least one corrector location that transmits light radiation.
    权利要求:
    Claims (15)
    [0001]
    REVENDICATIONS1. A device (100; 200) for treating light radiation (108) comprising at least two reflecting optical elements (102, 104) defining a multipass cavity (106) so that at least one of said optical elements (102, 104) reflects said light radiation (108) at least twice, characterized in that it comprises at least one element, said corrector, having at least one location, said corrector, performing a reflection or a transmission of said optical radiation and whose surface is irregular so that the spatial phase profile of said correcting location (116) has a different phase shift for a plurality of different reflection / transmission points of said correcting location (116). 15
    [0002]
    2. Device (100; 200) according to the preceding claim, characterized in that at least one corrective optical element is one of the reflective optical elements defining the multipass cavity.
    [0003]
    3. Device according to any one of claims 1 or 2, characterized in that it comprises at least two corrector elements respectively corresponding to the reflective optical elements defining the multipass cavity.
    [0004]
    4. Device according to any one of the preceding claims, characterized in that at least one corrector element is disposed in the multipass cavity and is distinct from the reflective optical elements defining said multipass cavity.
    [0005]
    5. Device (100; 200) according to any one of the preceding claims, characterized in that at least one correction element (102) comprises a plurality of correcting locations (116) and at least two of said correcting locations (116). ) have different phase profiles.-21-
    [0006]
    6. Device according to any one of the preceding claims, characterized in that at least one correction element comprises a plurality of correcting locations and at least two of said correcting locations have identical phase profiles.
    [0007]
    7. Device (100; 200) according to any one of the preceding claims, characterized in that at least one corrective optical element (102) comprises at least one phase plate at at least one corrector position (116) . 10
    [0008]
    8. Device according to any one of the preceding claims, characterized in that at least one corrective optical element (102) comprises a single phase plate having at least two spatial phase profiles for at least two correcting locations (116). 15
    [0009]
    9. Device (200) according to any one of the preceding claims, characterized in that the reflective optical elements (102, 104) defining the multipass cavity (106) are positioned in two directions (202, 204) perpendicular to each other, said device (200) further comprising a mirror (206) disposed opposite said reflective optical elements (102, 104) at an angle of 45 ° to the direction (202, 204) of each of said reflective optical elements (102); , 104). 25
    [0010]
    10. Device (100; 200) according to any one of the preceding claims, characterized in that one (102) of the reflective optical elements comprises a plane reflective surface (112) and the other (104) reflective optical elements. has a curved reflective surface (114). 30
    [0011]
    A system for processing optical radiation (108) by a succession of propagations, comprising: - a correction device (100, 200) according to any of claims 1 to 10; - means for injecting said radiation ( 108) in said corrector device - means for collecting said radiation (108) at the output of said corrector device. 5
    [0012]
    12. Method (300) for designing a device (100, 200) according to any one of claims 1 to 10, said method (300) comprising the following steps: - propagating (304) the optical radiation to be treated (108) and a so-called reference radiation in a multipass cavity (106) defined between two reflecting optical elements (102, 104) so that at least one (102) of said optical elements (102, 104) reflects said optical radiation (108); ) at least twice in at least two different reflection locations; Optimizing (306) the interference between said radiations, said optimization comprising at least one iteration of the following steps carried out for at least one corrective location, on at least one corrector element: determining (308, 310) a parameter relating to interference between said radiations, and - modifying (312) the spatial phase profile of said at least one correction location; and - configuring (314), at said at least one correcting location, the phase profile, determined in said optimization step, and providing the optimized interference.
    [0013]
    13. Method (300) according to the preceding claim, characterized in that the reference radiation is: - optical radiation actually propagated in said multipass cavity (106); or - virtual light radiation represented by a set of digital data.
    [0014]
    14. Method (300) according to any one of claims 12 or 13, characterized in that the radiation to be treated (108) is obtained at the output of a scattering medium traversed by said radiation to be treated, and the reference radiation is identical to said radiation to be treated before said radiation to be treated has traveled said diffusing medium.
    [0015]
    15. System (400) for designing a device according to any one of claims 1 to 10, said system (400) comprising: - at least one means for propagating the optical radiation to be treated and a so-called reference radiation in a multipass cavity (106) defined between two reflective optical elements (102, 104) so that at least one of said optical elements reflects said optical radiation (108) at least twice in at least two different reflection locations; means (404, 406) for optimizing the interference between said radiations, said optimization comprising at least one iteration of the following steps carried out for at least one correction location on at least one corrector element: determining a parameter relating to a interference between said radiations, and - modifying the spatial phase profile of said at least one correction location; and at least one means for configuring, at said at least one corrective location, the phase profile, determined in said optimization step, and providing the optimized interference.
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    US20170010463A1|2017-01-12|
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    法律状态:
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    2021-01-25| PLFP| Fee payment|Year of fee payment: 8 |
    2022-01-31| PLFP| Fee payment|Year of fee payment: 9 |
    优先权:
    申请号 | 申请日 | 专利标题
    FR1450715A|FR3016973B1|2014-01-30|2014-01-30|DEVICE FOR PROCESSING LIGHT / OPTICAL RADIATION, METHOD AND SYSTEM FOR DESIGNING SUCH A DEVICE|FR1450715A| FR3016973B1|2014-01-30|2014-01-30|DEVICE FOR PROCESSING LIGHT / OPTICAL RADIATION, METHOD AND SYSTEM FOR DESIGNING SUCH A DEVICE|
    US15/113,761| US10324286B2|2014-01-30|2015-01-15|Device for processing light/optical radiation, method and system for designing such a device|
    AU2015213086A| AU2015213086A1|2014-01-30|2015-01-15|Device for processing light/optical radiation, method and system for designing such a device|
    EP15702649.3A| EP3100095B1|2014-01-30|2015-01-15|Device for processing light/optical radiation, method and system for designing such a device|
    JP2016567142A| JP6561072B2|2014-01-30|2015-01-15|Apparatus for processing light / optical radiation and methods and systems for designing the apparatus|
    CN201910897652.2A| CN110764240B|2014-01-30|2015-01-15|Device for processing optical radiation|
    CA2936562A| CA2936562A1|2014-01-30|2015-01-15|Device for processing light/optical radiation, method and system for designing such a device|
    PCT/EP2015/050711| WO2015113831A1|2014-01-30|2015-01-15|Device for processing light/optical radiation, method and system for designing such a device|
    CN201580006509.XA| CN106030372B|2014-01-30|2015-01-15|The method and system of light/optical radiation processing unit, this device of design|
    US16/405,645| US10627619B2|2014-01-30|2019-05-07|Device for processing light/optical radiation, method and system for designing such a device|
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